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Weiyi company owns two wholly owned subsidiaries, Feng Feng Grinding Wheel Co.,Ltd and Shandong Weiyi important and export Co., Ltd. Feng Feng Grinding wheel Co., Ltd product Weiyi metallographic cutting wheel and Liboshi High resin grinding wheel and polished piece, these products were exported to more than 70 countries around the world. 

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VTC-600-2HD DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater

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Product description
Model
VTC-600-2HD DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater
Brief Introduction
VTC-600-2HD is a magnetron sputtering system featuring dual target sources: 1) DC source for coating metallic material on one head and 2) RF source for coating non-metallic material on the other head. It is equipped with a film thickness tracker to enable the user to easily monitor the coating progress and also record the data.
This model is sophsticatedly designed for coating single or multiple film layers of a wide range of substrate materials (ferroelectric, condutive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE and etc). Its compactness and ease of operation make it an ideal coating system for use in R&D labs.
Technical Parameter
Input Power
220VAC 50/60Hz, single phase
2000W  (including pump)
Source Power
Two sputtering power sources are integrated into one control box  
DC source: 500W for coating metallic materials 
RF source: 600W with automatching for coating non-metallic materials
Compact 300 RF source is available at extra cost 
Magnetron Sputtering Head
Two 2" Magnetron Sputtering  Heads with water cooling jackets are included ( click picture-left to see detailed specs )
One is connected to RF power supply for no-conductive materials
Another is connected to DC sputtering power source for coating metallic materials
Target size requirement: 2" diameter
1/16" max. thickness for metallic targets
1/4" max. thickness for no-conductive targets
One stainless steel and one Al2O3 ceramic targets are included for demo testing
Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled recirculating water chiller is included for cooling both magnetron sputtering heads
Customized coater:  two RF head without DC sputering, 3 RF head are available upon request
Vacuum Chamber
Sample holder size: 140mm dia. for. 4" wafer max
Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control
Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
Flow rate:  200 ml/min max.
Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump Station
High speed turbo vacuum pump system (made in Germany) is directly installed on the vacuum chamber for max. vacuum level
Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed
Mobile pump station is included and the compact sputtering coater can be put on top of station
Max. vacuum level: 10^-6 torr with chamber baking
Thickness Monitor
One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å  
LED Display Unit outside chamber can:
Input material to be coated according to data base included
Display total thickness coated and coating speed
5 pcs quartz sensors (consumable) are included 
Water cooling is required
Water Chiller
One digital temperature controlled recirculating water chiller is included.
Refrigeration range: 5~35 °C
Flow rate: 16 L/min
Pump pressure: 14 psi
Overall Dimensions
L1300mm× W660mm× H1200mm
Net Weight
160 kg
Warranty
One years limited warranty with lifetime support
Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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